4 Position SILAR Coating System with Air-tight Chamber & Magnetic Stirrer

An air-tight chamber with a front observation window. The unit provides inlet and outlet valves for inert gas purging. This helps to protect samples from moisture or oxygen exposure at the end of the coating process. It provides four separate platforms to place coating solutions each with magnetic stirrer. User can also control the speed of the magnetic stirrer for each beaker independently by using the knobs on the front panel of the controller.

In this technique, the thin film is deposited on glass substrate following a chemical technique called successive ion layer adsorption and reaction (SILAR). The technique involves multiple dipping of the substrate in a given solution and deionized water, the temperature of both can vary from case to case.

SPECIFICATIONS

Power Input	208-240VAC, 50/ 60Hz
Air Tight Chamber	Provision of inlet and outlet valves for gas purging Chamber size: 640L x 475W x 575H mm
Actuator	Stepper motor
Drive Mechanism	Lead screw
Dip Duration	0 - 99 seconds / minutes / hours
Speed Control	Drawing speed adjustable from a digital panel from 2 microns/sec to 9000 micron/sec ( Max.)
Number of Dips	1 - 999
Stirrer Speed	0 - 999 rpm Independent speed control over 4 working positions
Stroke length Max.	100 mm
Control Unit	Speed and mode control via LED display
Warranty	One year limited with lifetime support
Dimension Drawing	575500640mm
Net Weight	130kg
Shipping Weight & Dimension	300 lbs, 40"Lx40"Wx40"H
Key parameters	l DC 500W+RF 300W l Dual magnetron sputtering head l Double film thickness monitor l With molecular pump set, 5E-3Pa l Two sets of mass flow meters l Rotating heating sample stage l Equipped with water cooler, air compressor