Dual-target RF magnetron sputtering coating machine

The dual-target magnetron sputtering coating equipment is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. Magnetron targets are available in 1 inch and 2 inches, customers can choose according to the size of the plated substrate; the power supply is 300W RF power supply plus 500W DC power supply, DC power supply can be used for the preparation of metal film, RF power supply can be used for non-metal For film preparation, two targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, they can customize DC power supply and pulse power supply. Various types of power supplies are available in various specifications from 300W to 1000W.

Sample stage

Size

φ185mm

Temperature control accuracy

±1

Heating temperature

Max 500

Rotate speed

1-20rpm adjustable

Magnetron Sputtering   target head

Quantity

2”×2 (1”,2” optional)

Water chiller

Circulating water chiller   with flow rate of 10L/min

Cooling mode

Water cooling

 

 

Vacuum chamber

Chamber size

φ300mm×300mm

Watch window

φ100mm

Chamber material

Stainless steel

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system

Model

AME-GZK103-A

Pumping interface

KF40

Molecular pump

CY-600

Exhaust interface

KF16

Backing pump

rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

1.0E-5Pa

Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump:   600L/S   rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

Quantity

RF power supply×2

Max output power

RF 300 W

Other parameters

Supply voltage

AC220V,50Hz

Overall size

600mm×650mm×1280mm

Total power

2.5KW

Total Weight

About 300kg

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